NEW
Ooznary - Centella PDRN Blender Mask
US$ 5.70
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Features
Benefits:
This hydrating sheet mask replenishes deep moisture to dry, thirsty skin.
Enriched with Centella PDRN to rapidly comfort and calm irritated or compromised skin.
Infused with a Hyaluronic Acid Complex to shield the skin's moisture barrier and lock in long-lasting inner hydration.
Formulated with a soft, plant-derived cellulose fiber sheet that holds rich essence and smoothly adheres to skin contours.
How to use:
1. After cleansing, prep your skin texture with toner.
2. Unfold the mask and apply it evenly over your face.
3. Remove the mask after 10 to 20 minutes and gently pat the remaining essence into the skin until fully absorbed.
1. After cleansing, prep your skin texture with toner.
2. Unfold the mask and apply it evenly over your face.
3. Remove the mask after 10 to 20 minutes and gently pat the remaining essence into the skin until fully absorbed.
Major Ingredients
Centella Asiatica Leaf Water,Water,Glycerin,Dipropylene Glycol,Glycereth-26,Niacinamide,1,2-Hexanediol,Polyglyceryl-10 Laurate,Propanediol,Arginine,Allantoin,Carbomer,Panthenol,Polyglyceryl-4 Caprate,Xanthan Gum,Ethylhexylglycerin,Fragrance,Adenosine,Disodium EDTA,Sodium Hyaluronate,Butylene Glycol,Centella Asiatica Extract,Caprylyl Glycol,Hydroxypropyltrimonium Hyaluronate,Hydrolyzed Hyaluronic Acid,Sodium Acetylated Hyaluronate,Acetyl Hexapeptide-8,Copper Tripeptide-1,Collagen,Elastin,Hexapeptide-9,Nonapeptide-1,Palmitoyl Pentapeptide-4,Palmitoyl Tripeptide-1,Palmitoyl Tetrapeptide-7,Tripeptide-1,Hyaluronic Acid,Hydrolyzed Sodium Hyaluronate,Sodium Hyaluronate Crosspolymer,Sodium DNA,Asiaticoside,Madecassoside,Asiatic Acid,Madecassic Acid,Potassium Hyaluronate
Ingredients subject to change at manufacturer's discretion. For the most complete and up-to-date list of ingredients, please refer to product packaging.
Details
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